mass action law
GATE Electronics & Communication · Semiconductors · 1995-2023
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All concepts →In an extrinsic semiconductor, the hole concentration is given to be 1.5$$n_i$$ where $$n_i$$ is the intrinsic carrier concentration of 1 $$\times$$ 10$$^{10}$$ $$cm^{-3}$$. The ra...
A bar of silicon is doped with boron concentration of $10^{16} \mathrm{cm}^{-3}$ and assumed to be fully ionized. It is exposed to light such that electron-hole pairs are generated...
Consider a silicon sample doped with N D = 1×10 15 /cm 3 donor atoms. Assume that the intrinsic carrier concentration n i = 1.5×10 10 /cm 3 . If the sample is additionally doped wi...
The source of a silicon (n i = 10 10 per cm 3 ) n - channel MOS transistor has an aewa of 1 sq $$\mu m$$ and a depth of 1 $$\mu m$$ . If the dopant density in the source is 10 19 /...
The concentration of minority carriers in an extrinsic semiconductor under equilibrium is:
The intrinsic carrier concentration of silicon sample at 300 o K is $$1.5\times10^{16}/m^3$$. If after doping, the number of majority carriers is $$5\times10^{20}/m^3$$ , minority...
In a P-type silicon sample, the hole concentration is $$2.25\times10^{15}/cm^3$$. If the intrinsic carrier concentration is $$1.5\times10^{15}/cm^3$$ , the electron concentration i...